PVD镀膜技术
PVD（物理气相沉积）是一种在真空环境下，利用物理方法将材料源（固体或液体）气化成原子、分子或使其部分电离成离子，然后通过低压气体（或等离子体）过程，在基体（工件）表面沉积具有特定功能的薄膜的技术。PVD涂层绿色环保，广泛应用于工具与模具、装饰与外观、半导体与微电子、光学器件、汽车、航空、医疗等。
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ALD Coating Technology
Atomic layer deposition (ALD) is a technique used to deposit thin films one atomic layer at a time. This technology is highly precise and offers excellent control over the film thickness.
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CVD Coating Technology
Chemical vapor deposition (CVD) is a process used to produce thin films through chemical reactions that occur when gas-phase precursors react on the substrate surface.
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